LASER DEPOSITION OF ALUMINIUM.

D. Cross, P. John, David Milne, J. I B Wilson

Research output: Contribution to journalArticle

Abstract

This paper reports on the laser CVD (Chemical Vapor Deposition) of aluminum. The program is aimed at producing metallic or metal silicide interconnects rather than doped polysilicon due to the more favorable RC time constant.

Original languageEnglish
Pages (from-to)3. 1-3. 4
JournalIEE Colloquium (Digest)
Issue number1986 /129
Publication statusPublished - 1986

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    Cross, D., John, P., Milne, D., & Wilson, J. I. B. (1986). LASER DEPOSITION OF ALUMINIUM. IEE Colloquium (Digest), (1986 /129), 3. 1-3. 4.