Ion sheath formation in radiofrequency inductive discharges

P. P. Vitruk, H. J. Baker, D. R. Hall

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)


A new mechanism is proposed which accounts for the formation of a positively charged ion sheath in RF inductive discharges, and which allows the quantitative prediction of the existence of high plasma- to-wall potential in such discharges. In this paper we consider electron oscillations in crossed magnetic and magnetic-field- induced electric fields for both collisionless and collisional plasmas, under conditions relevant to plasma processing and gas discharge lamp applications.

Original languageEnglish
Pages (from-to)677-679
Number of pages3
JournalJournal of Physics D: Applied Physics
Issue number3
Publication statusPublished - 1994


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