Ion sheath formation in radiofrequency inductive discharges

P. P. Vitruk; H. J. Baker; D. R. Hall

doi:10.1088/0022-3727/27/3/038

Ion sheath formation in radiofrequency inductive discharges

P. P. Vitruk, H. J. Baker, D. R. Hall

School of Engineering & Physical Sciences

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

A new mechanism is proposed which accounts for the formation of a positively charged ion sheath in RF inductive discharges, and which allows the quantitative prediction of the existence of high plasma- to-wall potential in such discharges. In this paper we consider electron oscillations in crossed magnetic and magnetic-field- induced electric fields for both collisionless and collisional plasmas, under conditions relevant to plasma processing and gas discharge lamp applications.

Original language	English
Pages (from-to)	677-679
Number of pages	3
Journal	Journal of Physics D: Applied Physics
Volume	27
Issue number	3
DOIs	https://doi.org/10.1088/0022-3727/27/3/038
Publication status	Published - 1994

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title = "Ion sheath formation in radiofrequency inductive discharges",

abstract = "A new mechanism is proposed which accounts for the formation of a positively charged ion sheath in RF inductive discharges, and which allows the quantitative prediction of the existence of high plasma- to-wall potential in such discharges. In this paper we consider electron oscillations in crossed magnetic and magnetic-field- induced electric fields for both collisionless and collisional plasmas, under conditions relevant to plasma processing and gas discharge lamp applications.",

author = "Vitruk, {P. P.} and Baker, {H. J.} and Hall, {D. R.}",

year = "1994",

doi = "10.1088/0022-3727/27/3/038",

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journal = "Journal of Physics D: Applied Physics",

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AU - Vitruk, P. P.

AU - Baker, H. J.

AU - Hall, D. R.

PY - 1994

Y1 - 1994

N2 - A new mechanism is proposed which accounts for the formation of a positively charged ion sheath in RF inductive discharges, and which allows the quantitative prediction of the existence of high plasma- to-wall potential in such discharges. In this paper we consider electron oscillations in crossed magnetic and magnetic-field- induced electric fields for both collisionless and collisional plasmas, under conditions relevant to plasma processing and gas discharge lamp applications.

AB - A new mechanism is proposed which accounts for the formation of a positively charged ion sheath in RF inductive discharges, and which allows the quantitative prediction of the existence of high plasma- to-wall potential in such discharges. In this paper we consider electron oscillations in crossed magnetic and magnetic-field- induced electric fields for both collisionless and collisional plasmas, under conditions relevant to plasma processing and gas discharge lamp applications.

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U2 - 10.1088/0022-3727/27/3/038

DO - 10.1088/0022-3727/27/3/038

M3 - Article

SN - 0022-3727

VL - 27

SP - 677

EP - 679

JO - Journal of Physics D: Applied Physics

JF - Journal of Physics D: Applied Physics

IS - 3

ER -

Ion sheath formation in radiofrequency inductive discharges

Abstract

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