Incorporation of oxygen atoms into As⁺ implanted silicon during cw CO₂ laser annealing in O₂

Physics

• Atoms 50%
• Carbon Dioxide Laser 100%
• Environment 50%
• Impurities 50%
• Ion Implantation 50%
• Laser Annealing 100%
• Laser Beams 50%
• Oxygen 50%
• Oxygen Atom 50%
• Shapes 50%
• Silicon 50%
• Sites 50%

Material Science

• Crystalline Material 50%
• Impurity 50%
• Infrared Spectroscopy 50%
• Reflection High-Energy Electron Diffraction 50%