Incorporation of oxygen atoms into As+ implanted silicon during cw CO2 laser annealing in O2

I W Boyd

Research output: Contribution to journalArticle

Abstract

By annealing Si layers amorphised by ion-implantation with a cw CO2 laser beam in oxygen rich environments, it has been possible to incorporate O atoms into the recrystallized lattice. Absorption measurements on such regrown layers by infrared spectrometry have shown that the impurities are preferentially bonded into substitutional lattice sites, rather than existing interstitially. Supplementary RHEED studies have indicated that ß-cristobalite, a crystalline form of SiO2, has been formed. These investigations highlight the importance of the ambient during cw laser annealing. © 1983 Springer-Verlag.

Original languageEnglish
Pages (from-to)71-74
Number of pages4
JournalApplied Physics A: Solids and Surfaces
Volume31
Issue number2
DOIs
Publication statusPublished - Jun 1983

Keywords

  • 42.60
  • 61.80
  • 78.50

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