Inclined nanoimprinting lithography-based 3D nanofabrication

Zhan Liu*, David G. Bucknall, Mark G. Allen

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)


We report a 'top-down' 3D nanofabrication approach combining non-conventional inclined nanoimprint lithography (INIL) with reactive ion etching (RIE), contact molding and 3D metal nanotransfer printing (nTP). This integration of processes enables the production and conformal transfer of 3D polymer nanostructures of varying heights to a variety of other materials including a silicon-based substrate, a silicone stamp and a metal gold (Au) thin film. The process demonstrates the potential of reduced fabrication cost and complexity compared to existing methods. Various 3D nanostructures in technologically useful materials have been fabricated, including symmetric and asymmetric nanolines, nanocircles and nanosquares. Such 3D nanostructures have potential applications such as angle-resolved photonic crystals, plasmonic crystals and biomimicking anisotropic surfaces. This integrated INIL-based strategy shows great promise for 3D nanofabrication in the fields of photonics, plasmonics and surface tribology.

Original languageEnglish
Article number065036
Number of pages11
JournalJournal of Micromechanics and Microengineering
Issue number6
Publication statusPublished - Jun 2011




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