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High-resolution sub-surface microscopy of CMOS integrated circuits using radially polarized light

  • Marius Rutkauskas
  • , C. Farrell
  • , C. Dorrer
  • , K. L. Marshall
  • , T. R. Lundquist
  • , P. Vedagarbha
  • , D. T. Reid

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Comparison of high-resolution sub-surface microscopy shows that illumination with linear polarization resolves an edge with resolutions of 95 nm and 120 nm, depending on E-field orientation, while radial polarization achieves a resolution of 98 nm.

Original languageEnglish
Title of host publicationCLEO: Science and Innovations, CLEO-SI 2015
PublisherOSA Publishing
ISBN (Print)978-1-55752-968-8
DOIs
Publication statusPublished - 2015
EventCLEO: Science and Innovations 2015 - San Jose, United States
Duration: 10 May 2015 → 15 May 2015

Conference

ConferenceCLEO: Science and Innovations 2015
Abbreviated titleCLEO-SI 2015
Country/TerritoryUnited States
CitySan Jose
Period10/05/15 → 15/05/15

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering
  • Atomic and Molecular Physics, and Optics

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