High mobility titanium-doped indium oxide for use in tandem solar cells deposited via pulsed DC magnetron sputtering

The effects of pulsed DC (PDC) magnetron sputtering on the crystalline structure of the high mobility transparent conducting oxide (TCO), titanium-doped indium oxide (ITiO), are investigated. High mobility (μ >100 V^-1s^-1cm²) ITiO films are deposited by PDC magnetron sputtering and compared to RF deposited films using optimized conditions. These high mobility ITiO films have shown to extend the transmission in the NIR region compared to typical TCOs, such as ITO, exhibiting their potential in a tandem or multiple junction solar cell application. ITiO films deposited by PDC magnetron sputtering offer an increased deposition rate without a significant reduction in mobility when compared to RF sputtering, thus potentially offering PDC as a preferred industrial choice over RF sputtering. Structural characterization of the ITiO films prepared by PDC show a change in crystalline orientation and crystallite shape when compared to RF films, measured by XRD and SEM, which have been linked with the electrical parameters of the TCO.