Growth rate, microstructure and conformality as a function of vapor exposure for zirconia thin films by pulsed-pressure MOCVD

Susan Krumdieck*, Asdis Kristinsdottir, Lynher Ramirez, Maxim Lebedev, Nicholas Long

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

14 Citations (Scopus)

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