Abstract
In this paper we report the first successful use of an electrochemical sulphur source to grown ZnSxSe1-x by the technique of molecular beam epitaxy. Photoluminescence measurements show that layers with 0=x=0.2 have been grown and that the material quality is comparable to that grown by other techniques. © 1989.
| Original language | English |
|---|---|
| Pages (from-to) | 176-179 |
| Number of pages | 4 |
| Journal | Journal of Crystal Growth |
| Volume | 101 |
| Issue number | 1-4 |
| Publication status | Published - 1 Apr 1990 |