Full-field analysis of wavefront errors in point diffraction interferometer with misaligned Gaussian incidence

Fen Gao, Thomas O’Donoghue, Wei Wang

Research output: Contribution to journalArticle

Abstract

The precision and accuracy of profile measurement achieved by a point diffraction interferometer (PDI) is determined by a spherical diffraction reference wavefront whose quality is mainly controlled by the pinhole’s alignment. In consideration of a Gaussian beam incidence, different diffraction wavefront errors stemming from misalignment of pinhole including lateral shift, defocus, and tilt are analyzed with the help of a proposed systematic model and a new evaluation criterion established under spherical coordinates. The full-field distributions of various diffraction wavefront errors are obtained through simulation. The predicted accuracy of an actual PDI makes a good agreement with the experiment results. The achieved results will be beneficial to the accuracy evaluation of a PDI before and after its design.

Original languageEnglish
Pages (from-to)210-216
Number of pages7
JournalApplied Optics
Volume59
Issue number1
Early online date3 Dec 2019
DOIs
Publication statusPublished - 1 Jan 2020

Fingerprint

Wavefronts
Interferometers
interferometers
incidence
Diffraction
diffraction
pinholes
Gaussian beams
spherical coordinates
evaluation
misalignment
alignment
shift
profiles
simulation
Experiments

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Engineering (miscellaneous)
  • Electrical and Electronic Engineering

Cite this

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Full-field analysis of wavefront errors in point diffraction interferometer with misaligned Gaussian incidence. / Gao, Fen; O’Donoghue, Thomas; Wang, Wei.

In: Applied Optics, Vol. 59, No. 1, 01.01.2020, p. 210-216.

Research output: Contribution to journalArticle

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