Fidelity comparison of phase masks for hybrid imaging

Tom Vettenburg; Andy Wood; Nicholas Bustin; Andrew R. Harvey

doi:10.1117/12.871043

Fidelity comparison of phase masks for hybrid imaging

Tom Vettenburg
, Andy Wood
, Nicholas Bustin
, Andrew R. Harvey

School of Engineering & Physical Sciences

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

A significantly increased defocus tolerance can be obtained by combining pupil phase-modulation with digital demodulation in a hybrid imaging system. Designing the optimal pupil phase-modulation is however not a trivial task. We show how hybrid imaging fidelity can be predicted and used to compare arbitrary phase-modulations. The evaluations of two anti-symmetric and a symmetric phase-modulation yield initial design values that can be used for the optimization of specific hybrid designs. © 2010 Copyright SPIE - The International Society for Optical Engineering.

Original language	English
Title of host publication	International Optical Design Conference 2010
Volume	7652
DOIs	https://doi.org/10.1117/12.871043
Publication status	Published - 2010
Event	International Optical Design Conference 2010 - Jackson Hole, WY, United States Duration: 13 Jun 2010 → 17 Jun 2010

Conference

Conference	International Optical Design Conference 2010
Country/Territory	United States
City	Jackson Hole, WY
Period	13/06/10 → 17/06/10

Keywords

aberration control
Computational imaging
defocus
design optimization
hybrid optical-digital imaging
phase mask
PSF-engineering
pupil-phase engineering
wavefront-coding

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10.1117/12.871043

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title = "Fidelity comparison of phase masks for hybrid imaging",

abstract = "A significantly increased defocus tolerance can be obtained by combining pupil phase-modulation with digital demodulation in a hybrid imaging system. Designing the optimal pupil phase-modulation is however not a trivial task. We show how hybrid imaging fidelity can be predicted and used to compare arbitrary phase-modulations. The evaluations of two anti-symmetric and a symmetric phase-modulation yield initial design values that can be used for the optimization of specific hybrid designs. {\textcopyright} 2010 Copyright SPIE - The International Society for Optical Engineering.",

keywords = "aberration control, Computational imaging, defocus, design optimization, hybrid optical-digital imaging, phase mask, PSF-engineering, pupil-phase engineering, wavefront-coding",

author = "Tom Vettenburg and Andy Wood and Nicholas Bustin and Harvey, \{Andrew R.\}",

year = "2010",

doi = "10.1117/12.871043",

language = "English",

isbn = "9780819480828",

volume = "7652",

booktitle = "International Optical Design Conference 2010",

note = "International Optical Design Conference 2010 ; Conference date: 13-06-2010 Through 17-06-2010",

}

TY - GEN

T1 - Fidelity comparison of phase masks for hybrid imaging

AU - Vettenburg, Tom

AU - Wood, Andy

AU - Bustin, Nicholas

AU - Harvey, Andrew R.

PY - 2010

Y1 - 2010

N2 - A significantly increased defocus tolerance can be obtained by combining pupil phase-modulation with digital demodulation in a hybrid imaging system. Designing the optimal pupil phase-modulation is however not a trivial task. We show how hybrid imaging fidelity can be predicted and used to compare arbitrary phase-modulations. The evaluations of two anti-symmetric and a symmetric phase-modulation yield initial design values that can be used for the optimization of specific hybrid designs. © 2010 Copyright SPIE - The International Society for Optical Engineering.

AB - A significantly increased defocus tolerance can be obtained by combining pupil phase-modulation with digital demodulation in a hybrid imaging system. Designing the optimal pupil phase-modulation is however not a trivial task. We show how hybrid imaging fidelity can be predicted and used to compare arbitrary phase-modulations. The evaluations of two anti-symmetric and a symmetric phase-modulation yield initial design values that can be used for the optimization of specific hybrid designs. © 2010 Copyright SPIE - The International Society for Optical Engineering.

KW - aberration control

KW - Computational imaging

KW - defocus

KW - design optimization

KW - hybrid optical-digital imaging

KW - phase mask

KW - PSF-engineering

KW - pupil-phase engineering

KW - wavefront-coding

UR - https://www.scopus.com/pages/publications/78049384901

U2 - 10.1117/12.871043

DO - 10.1117/12.871043

M3 - Conference contribution

SN - 9780819480828

VL - 7652

BT - International Optical Design Conference 2010

T2 - International Optical Design Conference 2010

Y2 - 13 June 2010 through 17 June 2010

ER -

Fidelity comparison of phase masks for hybrid imaging

Abstract

Conference

Keywords

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