Fabrication of three-dimensional nano-patterns by inclined nanoimprinting lithography

Zhan Liu; David G. Bucknall; Mark G. Allen

doi:10.1109/SENSOR.2007.4300459

Fabrication of three-dimensional nano-patterns by inclined nanoimprinting lithography

Zhan Liu^*, David G. Bucknall, Mark G. Allen

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Citation (Scopus)

Abstract

We report a non-conventional nanofabrication approach, Inclined Nanoimprint Lithography (INIL), which can produce three-dimensional (3-D) nano-patterns of varying heights in a single imprinting step with the potential for low cost and high throughput. Such 3-D nano-patterns can be produced using soft lithography without the need for conventional nano- lithography of either the imprinting mold or the substrate, by exploiting the technique of anisotropic de-wetting. We demonstrate the INIL technique using a commercially available nanolithography resist, poly(methyl-alpha-chloroacrylate-co-alpha-methylstyrene), and demonstrate 3-D pattern transfer to silicon dioxide using reactive ion etching.

Original language	English
Title of host publication	Transducers '07 & Eurosensors XXI, Digest of Technical Papers, Vols 1 and 2
Place of Publication	New York
Publisher	IEEE
Pages	1621-1624
Number of pages	2
ISBN (Electronic)	1-4244-0842-3
ISBN (Print)	1-4244-0842-3
DOIs	https://doi.org/10.1109/SENSOR.2007.4300459
Publication status	Published - 2007
Event	14th International Conference on Solid-State Sensors, Actuators and Microsystems - Lyon, France Duration: 10 Jun 2007 → 14 Jun 2007

Conference

Conference	14th International Conference on Solid-State Sensors, Actuators and Microsystems
Country/Territory	France
Period	10/06/07 → 14/06/07

Keywords

Inclined Nanoimprint Lithography
de-wetting
nanofabrication
soft lithography

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10.1109/SENSOR.2007.4300459

http://www.scopus.com/inward/record.url?scp=50049119631&partnerID=8YFLogxK

Cite this

@inproceedings{6abf22c28f5446d58b6b051d695c95d3,

title = "Fabrication of three-dimensional nano-patterns by inclined nanoimprinting lithography",

abstract = "We report a non-conventional nanofabrication approach, Inclined Nanoimprint Lithography (INIL), which can produce three-dimensional (3-D) nano-patterns of varying heights in a single imprinting step with the potential for low cost and high throughput. Such 3-D nano-patterns can be produced using soft lithography without the need for conventional nano- lithography of either the imprinting mold or the substrate, by exploiting the technique of anisotropic de-wetting. We demonstrate the INIL technique using a commercially available nanolithography resist, poly(methyl-alpha-chloroacrylate-co-alpha-methylstyrene), and demonstrate 3-D pattern transfer to silicon dioxide using reactive ion etching.",

keywords = "Inclined Nanoimprint Lithography, de-wetting, nanofabrication, soft lithography",

author = "Zhan Liu and Bucknall, {David G.} and Allen, {Mark G.}",

year = "2007",

doi = "10.1109/SENSOR.2007.4300459",

language = "English",

isbn = "1-4244-0842-3",

pages = "1621--1624",

booktitle = "Transducers '07 & Eurosensors XXI, Digest of Technical Papers, Vols 1 and 2",

publisher = "IEEE",

address = "United States",

note = "14th International Conference on Solid-State Sensors, Actuators and Microsystems ; Conference date: 10-06-2007 Through 14-06-2007",

}

Liu, Z, Bucknall, DG & Allen, MG 2007, Fabrication of three-dimensional nano-patterns by inclined nanoimprinting lithography. in Transducers '07 & Eurosensors XXI, Digest of Technical Papers, Vols 1 and 2. IEEE, New York, pp. 1621-1624, 14th International Conference on Solid-State Sensors, Actuators and Microsystems, France, 10/06/07. https://doi.org/10.1109/SENSOR.2007.4300459

TY - GEN

T1 - Fabrication of three-dimensional nano-patterns by inclined nanoimprinting lithography

AU - Liu, Zhan

AU - Bucknall, David G.

AU - Allen, Mark G.

PY - 2007

Y1 - 2007

N2 - We report a non-conventional nanofabrication approach, Inclined Nanoimprint Lithography (INIL), which can produce three-dimensional (3-D) nano-patterns of varying heights in a single imprinting step with the potential for low cost and high throughput. Such 3-D nano-patterns can be produced using soft lithography without the need for conventional nano- lithography of either the imprinting mold or the substrate, by exploiting the technique of anisotropic de-wetting. We demonstrate the INIL technique using a commercially available nanolithography resist, poly(methyl-alpha-chloroacrylate-co-alpha-methylstyrene), and demonstrate 3-D pattern transfer to silicon dioxide using reactive ion etching.

AB - We report a non-conventional nanofabrication approach, Inclined Nanoimprint Lithography (INIL), which can produce three-dimensional (3-D) nano-patterns of varying heights in a single imprinting step with the potential for low cost and high throughput. Such 3-D nano-patterns can be produced using soft lithography without the need for conventional nano- lithography of either the imprinting mold or the substrate, by exploiting the technique of anisotropic de-wetting. We demonstrate the INIL technique using a commercially available nanolithography resist, poly(methyl-alpha-chloroacrylate-co-alpha-methylstyrene), and demonstrate 3-D pattern transfer to silicon dioxide using reactive ion etching.

KW - Inclined Nanoimprint Lithography

KW - de-wetting

KW - nanofabrication

KW - soft lithography

U2 - 10.1109/SENSOR.2007.4300459

DO - 10.1109/SENSOR.2007.4300459

M3 - Conference contribution

SN - 1-4244-0842-3

SP - 1621

EP - 1624

BT - Transducers '07 & Eurosensors XXI, Digest of Technical Papers, Vols 1 and 2

PB - IEEE

CY - New York

T2 - 14th International Conference on Solid-State Sensors, Actuators and Microsystems

Y2 - 10 June 2007 through 14 June 2007

ER -

Fabrication of three-dimensional nano-patterns by inclined nanoimprinting lithography

Abstract

Conference

Keywords

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