Fabrication of three-dimensional nano-patterns by inclined nanoimprinting lithography

Zhan Liu, David G. Bucknall, Mark G. Allen

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)


We report a non-conventional nanofabrication approach, Inclined Nanoimprint Lithography (INIL), which can produce three-dimensional (3-D) nano-patterns of varying heights in a single imprinting step with the potential for low cost and high throughput. Such 3-D nano-patterns can be produced using soft lithography without the need for conventional nano- lithography of either the imprinting mold or the substrate, by exploiting the technique of anisotropic de-wetting. We demonstrate the INIL technique using a commercially available nanolithography resist, poly(methyl-alpha-chloroacrylate-co-alpha-methylstyrene), and demonstrate 3-D pattern transfer to silicon dioxide using reactive ion etching.

Original languageEnglish
Title of host publicationTransducers '07 & Eurosensors XXI, Digest of Technical Papers, Vols 1 and 2
Place of PublicationNew York
Number of pages2
ISBN (Electronic)1-4244-0842-3
ISBN (Print)1-4244-0842-3
Publication statusPublished - 2007
Event14th International Conference on Solid-State Sensors, Actuators and Microsystems - Lyon, France
Duration: 10 Jun 200714 Jun 2007


Conference14th International Conference on Solid-State Sensors, Actuators and Microsystems


  • Inclined Nanoimprint Lithography
  • de-wetting
  • nanofabrication
  • soft lithography

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