Abstract
We report a non-conventional nanofabrication approach, Inclined Nanoimprint Lithography (INIL), which can produce three-dimensional (3-D) nano-patterns of varying heights in a single imprinting step with the potential for low cost and high throughput. Such 3-D nano-patterns can be produced using soft lithography without the need for conventional nano- lithography of either the imprinting mold or the substrate, by exploiting the technique of anisotropic de-wetting. We demonstrate the INIL technique using a commercially available nanolithography resist, poly(methyl-alpha-chloroacrylate-co-alpha-methylstyrene), and demonstrate 3-D pattern transfer to silicon dioxide using reactive ion etching.
Original language | English |
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Title of host publication | Transducers '07 & Eurosensors XXI, Digest of Technical Papers, Vols 1 and 2 |
Place of Publication | New York |
Publisher | IEEE |
Pages | 1621-1624 |
Number of pages | 2 |
ISBN (Electronic) | 1-4244-0842-3 |
ISBN (Print) | 1-4244-0842-3 |
DOIs | |
Publication status | Published - 2007 |
Event | 14th International Conference on Solid-State Sensors, Actuators and Microsystems - Lyon, France Duration: 10 Jun 2007 → 14 Jun 2007 |
Conference
Conference | 14th International Conference on Solid-State Sensors, Actuators and Microsystems |
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Country/Territory | France |
Period | 10/06/07 → 14/06/07 |
Keywords
- Inclined Nanoimprint Lithography
- de-wetting
- nanofabrication
- soft lithography