INIS
modeling
100%
liquids
100%
ultrasonics
100%
precursor
100%
chemical vapor deposition
100%
atomization
100%
growth
66%
microstructure
66%
surfaces
66%
efficiency
66%
conversion
66%
deposition
66%
substrates
33%
control
33%
variations
33%
layers
33%
nickel
33%
injection
33%
saturation
33%
films
33%
titanium
33%
crystallography
33%
optimization
33%
orientation
33%
mass balance
33%
Engineering
Atomisation
100%
Microstructure
100%
Experimental Characterization
100%
Conversion Efficiency
100%
Liquid Precursor
100%
Ultrasonics
100%
Injection Rate
50%
Great Deal
50%
Crystallographic Orientation
50%
High Growth Rate
50%
Deposition Temperature
50%
Rate Conversion
50%
Growing Film Surface
50%
Mass Balance
50%
Chemical Engineering
Atomizer Nozzle
100%
Metallorganic Chemical Vapor Deposition
100%