Experimental characterization and modeling of pulsed MOCVD with ultrasonic atomization of liquid precursor

Susan P. Krumdieck; Rishi Raj

doi:10.1002/1521-3862(200103)7:2<85::AID-CVDE85>3.0.CO;2-9

Experimental characterization and modeling of pulsed MOCVD with ultrasonic atomization of liquid precursor

Susan P. Krumdieck^*, Rishi Raj

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

25 Citations (Scopus)

Abstract

Layers of titania were deposited on nickel substrates by an innovative process called pulsed MOCVD. Variation in growth rate, conversion efficiency, crystallographic orientation, and microstructure were studied as functions of precursor injection rate and deposition temperature. Pulsed-MOCVD was found to provide a great deal of control of microstructure, optimization for high growth rates, and high conversion efficiency. A Langmuir derivation of mass balance on the growing film surface with a surface saturation condition was used to model the deposition.

Original language	English
Pages (from-to)	85-90
Number of pages	6
Journal	Chemical Vapor Deposition
Volume	7
Issue number	2
DOIs	https://doi.org/10.1002/1521-3862(200103)7:2<85::AID-CVDE85>3.0.CO;2-9
Publication status	Published - Mar 2001

Keywords

Microstructure
MOCVD
Precursor delivery system
Titanium isopropoxide

ASJC Scopus subject areas

General Chemistry
Surfaces and Interfaces
Process Chemistry and Technology

Access to Document

10.1002/1521-3862(200103)7:2<85::AID-CVDE85>3.0.CO;2-9

Cite this

@article{493122da9ee14432868c6105e885f48f,

title = "Experimental characterization and modeling of pulsed MOCVD with ultrasonic atomization of liquid precursor",

abstract = "Layers of titania were deposited on nickel substrates by an innovative process called pulsed MOCVD. Variation in growth rate, conversion efficiency, crystallographic orientation, and microstructure were studied as functions of precursor injection rate and deposition temperature. Pulsed-MOCVD was found to provide a great deal of control of microstructure, optimization for high growth rates, and high conversion efficiency. A Langmuir derivation of mass balance on the growing film surface with a surface saturation condition was used to model the deposition.",

keywords = "Microstructure, MOCVD, Precursor delivery system, Titanium isopropoxide",

author = "Krumdieck, {Susan P.} and Rishi Raj",

year = "2001",

month = mar,

doi = "10.1002/1521-3862(200103)7:2<85::AID-CVDE85>3.0.CO;2-9",

language = "English",

volume = "7",

pages = "85--90",

journal = "Chemical Vapor Deposition",

issn = "0948-1907",

publisher = "Wiley-VCH Verlag",

number = "2",

}

TY - JOUR

T1 - Experimental characterization and modeling of pulsed MOCVD with ultrasonic atomization of liquid precursor

AU - Krumdieck, Susan P.

AU - Raj, Rishi

PY - 2001/3

Y1 - 2001/3

N2 - Layers of titania were deposited on nickel substrates by an innovative process called pulsed MOCVD. Variation in growth rate, conversion efficiency, crystallographic orientation, and microstructure were studied as functions of precursor injection rate and deposition temperature. Pulsed-MOCVD was found to provide a great deal of control of microstructure, optimization for high growth rates, and high conversion efficiency. A Langmuir derivation of mass balance on the growing film surface with a surface saturation condition was used to model the deposition.

AB - Layers of titania were deposited on nickel substrates by an innovative process called pulsed MOCVD. Variation in growth rate, conversion efficiency, crystallographic orientation, and microstructure were studied as functions of precursor injection rate and deposition temperature. Pulsed-MOCVD was found to provide a great deal of control of microstructure, optimization for high growth rates, and high conversion efficiency. A Langmuir derivation of mass balance on the growing film surface with a surface saturation condition was used to model the deposition.

KW - Microstructure

KW - MOCVD

KW - Precursor delivery system

KW - Titanium isopropoxide

UR - http://www.scopus.com/inward/record.url?scp=0002979766&partnerID=8YFLogxK

U2 - 10.1002/1521-3862(200103)7:2<85::AID-CVDE85>3.0.CO;2-9

DO - 10.1002/1521-3862(200103)7:2<85::AID-CVDE85>3.0.CO;2-9

M3 - Article

AN - SCOPUS:0002979766

SN - 0948-1907

VL - 7

SP - 85

EP - 90

JO - Chemical Vapor Deposition

JF - Chemical Vapor Deposition

IS - 2

ER -

Experimental characterization and modeling of pulsed MOCVD with ultrasonic atomization of liquid precursor

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this