Experimental characterization and modeling of pulsed MOCVD with ultrasonic atomization of liquid precursor

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25 Citations (Scopus)

Abstract

Layers of titania were deposited on nickel substrates by an innovative process called pulsed MOCVD. Variation in growth rate, conversion efficiency, crystallographic orientation, and microstructure were studied as functions of precursor injection rate and deposition temperature. Pulsed-MOCVD was found to provide a great deal of control of microstructure, optimization for high growth rates, and high conversion efficiency. A Langmuir derivation of mass balance on the growing film surface with a surface saturation condition was used to model the deposition.

Original languageEnglish
Pages (from-to)85-90
Number of pages6
JournalChemical Vapor Deposition
Volume7
Issue number2
DOIs
Publication statusPublished - Mar 2001

Keywords

  • Microstructure
  • MOCVD
  • Precursor delivery system
  • Titanium isopropoxide

ASJC Scopus subject areas

  • Chemistry(all)
  • Surfaces and Interfaces
  • Process Chemistry and Technology

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