Abstract
The scaling that has governed the continual increase in density, performance, and efficiency of electronic devices is rapidly reaching its inevitable limitations. In order to sustain the trend of ever-increasing bandwidth and performance, new technologies are being considered. Among the many competitors, nanophotonic technologies are especially poised to have an impact on the field of integrated devices. Here, we examine the available technologies, both traditional photonics and plasmonics, with emphasis on the latter. A summary of the previous advances in the field of nanophotonics (interconnects and modulators), along with more recent works investigating novel and CMOS-compatible materials, are presented with a graphical comparison of their performance. We suggest that nanophotonic technologies offer key advantages for future hybrid electrophotonic devices, where the movement toward new material platforms is a precursor to high-performance, industry-ready devices. (C) 2014 Optical Society of America
Original language | English |
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Pages (from-to) | 121-142 |
Number of pages | 22 |
Journal | Journal of the Optical Society of America B: Optical Physics |
Volume | 32 |
Issue number | 1 |
DOIs | |
Publication status | Published - Jan 2015 |
Keywords
- POLARITON WAVE-GUIDES
- TRIANGULAR METAL WEDGES
- PULSED-LASER DEPOSITION
- ALL-OPTICAL MODULATION
- THIN-FILMS
- TITANIUM NITRIDE
- SURFACE-PLASMONS
- TELECOM WAVELENGTHS
- ACTIVE PLASMONICS
- TELECOMMUNICATION WAVELENGTHS