INIS
thin films
100%
deposition
100%
films
100%
lasers
100%
doped materials
100%
oxyfluorides
100%
silicates
100%
substrates
33%
temperature range 0273-0400 k
33%
ions
33%
etching
33%
scanning electron microscopy
16%
dynamics
16%
transmission
16%
comparative evaluations
16%
spectra
16%
surfaces
16%
range
16%
thickness
16%
oxygen
16%
glass
16%
beams
16%
silica
16%
waveguides
16%
computer codes
16%
attenuation
16%
irradiation
16%
refraction
16%
excimer lasers
16%
prisms
16%
argon fluorides
16%
spectrophotometers
16%
Engineering
Pulsed Laser
100%
Deposited Film
100%
Thin Films
100%
Room Temperature
66%
Mols
33%
Flow Dynamics
33%
Pure Silica
33%
Target Surface
33%
Laser Fluence
33%
Optical Spectrum
33%
Refraction Index
33%
Excimer Laser
33%
Extinction Coefficient
33%
Waveguide
33%
Optical Transmission
33%
Physics
Thin Films
100%
Room Temperature
100%
Pulsed Laser Deposition
100%
Flow Dynamics
50%
Spectra
50%
Fluence
50%
Scanning Electron Microscopy
50%
Optical Waveguides
50%
Film Thickness
50%
Excimer Laser
50%
Spectrophotometer
50%
Material Science
Pulsed Laser Deposition
100%
Film
100%
Silicate
100%
Thin Films
100%
Reactive Ion Etching
40%
Scanning Electron Microscopy
20%
Waveguide
20%
Film Thickness
20%
Glass Composition
20%
Flow Dynamics
20%
Silicon Dioxide
20%