Enhanced Nonlinear Refractive Index in Epsilon-Near-Zero Materials

Lucia Caspani; Muhammad Rishad Kaipurath; Matteo Clerici; Marcello Ferrera; Thomas Roger; J. Kim; Nathaniel Kinsey; Monika Pietrzyk; Andrea Di Falco; Vladimir M. Shalaev; Alexandra Boltasseva; Daniele Franco Angelo Faccio

doi:10.1103/PhysRevLett.116.233901

Enhanced Nonlinear Refractive Index in Epsilon-Near-Zero Materials

Lucia Caspani
, Muhammad Rishad Kaipurath
, Matteo Clerici
, Marcello Ferrera
, Thomas Roger
, J. Kim
, Nathaniel Kinsey
, Monika Pietrzyk
, Andrea Di Falco
, Vladimir M. Shalaev
, Alexandra Boltasseva
, Daniele Franco Angelo Faccio

Research output: Contribution to journal › Article › peer-review

449 Citations (Scopus)

336 Downloads (Pure)

Abstract

New propagation regimes for light arise from the ability to tune the dielectric permittivity toextremely low values. Here we demonstrate a universal approach based on the low linear permittivityvalues attained in the epsilon-near-zero (ENZ) regime for enhancing the nonlinear refractive index,which enables remarkable light-induced changes of the material properties. Experiments performedon Al-doped ZnO (AZO) thin films show a six-fold increase of the Kerr nonlinear refractive index(n2) at the ENZ wavelength, located in the 1300 nm region. This in turn leads to light-inducedrefractive index changes of the order of unity, thus representing a new paradigm for nonlinear optics.

Original language	English
Article number	233901
Journal	Physical Review Letters
Volume	116
Issue number	23
DOIs	https://doi.org/10.1103/PhysRevLett.116.233901
Publication status	Published - 8 Jun 2016

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10.1103/PhysRevLett.116.233901

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Enhanced nonlinear refractive index in epsilon-near-zero materials
Faccio, D. F. A. (Creator), Caspani, L. (Creator), Clerici, M. (Creator) & Ferrera, M. (Creator), Heriot-Watt University, 19 Apr 2016
DOI: 10.17861/d82f29dc-5c47-4c5a-b893-c1ea93ab5224
Dataset

Marcello Ferrera
- M.Ferrerahw.acuk
- School of Engineering & Physical Sciences - Professor
- School of Engineering & Physical Sciences, Institute of Photonics and Quantum Sciences - Professor
Person: Academic (Research & Teaching)

Cite this

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title = "Enhanced Nonlinear Refractive Index in Epsilon-Near-Zero Materials",

abstract = "New propagation regimes for light arise from the ability to tune the dielectric permittivity toextremely low values. Here we demonstrate a universal approach based on the low linear permittivityvalues attained in the epsilon-near-zero (ENZ) regime for enhancing the nonlinear refractive index,which enables remarkable light-induced changes of the material properties. Experiments performedon Al-doped ZnO (AZO) thin films show a six-fold increase of the Kerr nonlinear refractive index(n2) at the ENZ wavelength, located in the 1300 nm region. This in turn leads to light-inducedrefractive index changes of the order of unity, thus representing a new paradigm for nonlinear optics.",

author = "Lucia Caspani and Kaipurath, \{Muhammad Rishad\} and Matteo Clerici and Marcello Ferrera and Thomas Roger and J. Kim and Nathaniel Kinsey and Monika Pietrzyk and \{Di Falco\}, Andrea and Shalaev, \{Vladimir M.\} and Alexandra Boltasseva and Faccio, \{Daniele Franco Angelo\}",

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doi = "10.1103/PhysRevLett.116.233901",

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AU - Caspani, Lucia

AU - Kaipurath, Muhammad Rishad

AU - Clerici, Matteo

AU - Ferrera, Marcello

AU - Roger, Thomas

AU - Kim, J.

AU - Kinsey, Nathaniel

AU - Pietrzyk, Monika

AU - Di Falco, Andrea

AU - Shalaev, Vladimir M.

AU - Boltasseva, Alexandra

AU - Faccio, Daniele Franco Angelo

PY - 2016/6/8

Y1 - 2016/6/8

N2 - New propagation regimes for light arise from the ability to tune the dielectric permittivity toextremely low values. Here we demonstrate a universal approach based on the low linear permittivityvalues attained in the epsilon-near-zero (ENZ) regime for enhancing the nonlinear refractive index,which enables remarkable light-induced changes of the material properties. Experiments performedon Al-doped ZnO (AZO) thin films show a six-fold increase of the Kerr nonlinear refractive index(n2) at the ENZ wavelength, located in the 1300 nm region. This in turn leads to light-inducedrefractive index changes of the order of unity, thus representing a new paradigm for nonlinear optics.

AB - New propagation regimes for light arise from the ability to tune the dielectric permittivity toextremely low values. Here we demonstrate a universal approach based on the low linear permittivityvalues attained in the epsilon-near-zero (ENZ) regime for enhancing the nonlinear refractive index,which enables remarkable light-induced changes of the material properties. Experiments performedon Al-doped ZnO (AZO) thin films show a six-fold increase of the Kerr nonlinear refractive index(n2) at the ENZ wavelength, located in the 1300 nm region. This in turn leads to light-inducedrefractive index changes of the order of unity, thus representing a new paradigm for nonlinear optics.

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DO - 10.1103/PhysRevLett.116.233901

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JO - Physical Review Letters

JF - Physical Review Letters

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Enhanced Nonlinear Refractive Index in Epsilon-Near-Zero Materials

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Enhanced nonlinear refractive index in epsilon-near-zero materials

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Marcello Ferrera

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