Enhanced Nonlinear Refractive Index in Epsilon-Near-Zero Materials

Lucia Caspani, Muhammad Rishad Kaipurath, Matteo Clerici, Marcello Ferrera, Thomas Roger, J. Kim, Nathaniel Kinsey, Monika Pietrzyk, Andrea Di Falco, Vladimir M. Shalaev, Alexandra Boltasseva, Daniele Franco Angelo Faccio

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381 Citations (Scopus)
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New propagation regimes for light arise from the ability to tune the dielectric permittivity toextremely low values. Here we demonstrate a universal approach based on the low linear permittivityvalues attained in the epsilon-near-zero (ENZ) regime for enhancing the nonlinear refractive index,which enables remarkable light-induced changes of the material properties. Experiments performedon Al-doped ZnO (AZO) thin films show a six-fold increase of the Kerr nonlinear refractive index(n2) at the ENZ wavelength, located in the 1300 nm region. This in turn leads to light-inducedrefractive index changes of the order of unity, thus representing a new paradigm for nonlinear optics.
Original languageEnglish
Article number233901
JournalPhysical Review Letters
Issue number23
Publication statusPublished - 8 Jun 2016


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