Enhanced Nonlinear Refractive Index in Epsilon-Near-Zero Materials

Lucia Caspani; Muhammad Rishad Kaipurath; Matteo Clerici; Marcello Ferrera; Thomas Roger; J. Kim; Nathaniel Kinsey; Monika Pietrzyk; Andrea Di Falco; Vladimir M. Shalaev; Alexandra Boltasseva; Daniele Franco Angelo Faccio

doi:10.1103/PhysRevLett.116.233901

Enhanced Nonlinear Refractive Index in Epsilon-Near-Zero Materials

Lucia Caspani, Muhammad Rishad Kaipurath, Matteo Clerici, Marcello Ferrera, Thomas Roger, J. Kim, Nathaniel Kinsey, Monika Pietrzyk, Andrea Di Falco, Vladimir M. Shalaev, Alexandra Boltasseva, Daniele Franco Angelo Faccio

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Abstract

New propagation regimes for light arise from the ability to tune the dielectric permittivity toextremely low values. Here we demonstrate a universal approach based on the low linear permittivityvalues attained in the epsilon-near-zero (ENZ) regime for enhancing the nonlinear refractive index,which enables remarkable light-induced changes of the material properties. Experiments performedon Al-doped ZnO (AZO) thin films show a six-fold increase of the Kerr nonlinear refractive index(n2) at the ENZ wavelength, located in the 1300 nm region. This in turn leads to light-inducedrefractive index changes of the order of unity, thus representing a new paradigm for nonlinear optics.

Original language	English
Article number	233901
Journal	Physical Review Letters
Volume	116
Issue number	23
DOIs	https://doi.org/10.1103/PhysRevLett.116.233901
Publication status	Published - 8 Jun 2016

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10.1103/PhysRevLett.116.233901

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Enhanced nonlinear refractive index in epsilon-near-zero materials
Faccio, D. F. A. (Creator), Caspani, L. (Creator), Clerici, M. (Creator) & Ferrera, M. (Creator), Heriot-Watt University, 19 Apr 2016
DOI: 10.17861/d82f29dc-5c47-4c5a-b893-c1ea93ab5224
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Marcello Ferrera
- M.Ferrerahw.acuk
- School of Engineering & Physical Sciences - Associate Professor
- School of Engineering & Physical Sciences, Institute of Photonics and Quantum Sciences - Associate Professor
Person: Academic (Research & Teaching)

Cite this

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title = "Enhanced Nonlinear Refractive Index in Epsilon-Near-Zero Materials",

abstract = "New propagation regimes for light arise from the ability to tune the dielectric permittivity toextremely low values. Here we demonstrate a universal approach based on the low linear permittivityvalues attained in the epsilon-near-zero (ENZ) regime for enhancing the nonlinear refractive index,which enables remarkable light-induced changes of the material properties. Experiments performedon Al-doped ZnO (AZO) thin films show a six-fold increase of the Kerr nonlinear refractive index(n2) at the ENZ wavelength, located in the 1300 nm region. This in turn leads to light-inducedrefractive index changes of the order of unity, thus representing a new paradigm for nonlinear optics.",

author = "Lucia Caspani and Kaipurath, {Muhammad Rishad} and Matteo Clerici and Marcello Ferrera and Thomas Roger and J. Kim and Nathaniel Kinsey and Monika Pietrzyk and {Di Falco}, Andrea and Shalaev, {Vladimir M.} and Alexandra Boltasseva and Faccio, {Daniele Franco Angelo}",

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AU - Caspani, Lucia

AU - Kaipurath, Muhammad Rishad

AU - Clerici, Matteo

AU - Ferrera, Marcello

AU - Roger, Thomas

AU - Kim, J.

AU - Kinsey, Nathaniel

AU - Pietrzyk, Monika

AU - Di Falco, Andrea

AU - Shalaev, Vladimir M.

AU - Boltasseva, Alexandra

AU - Faccio, Daniele Franco Angelo

PY - 2016/6/8

Y1 - 2016/6/8

N2 - New propagation regimes for light arise from the ability to tune the dielectric permittivity toextremely low values. Here we demonstrate a universal approach based on the low linear permittivityvalues attained in the epsilon-near-zero (ENZ) regime for enhancing the nonlinear refractive index,which enables remarkable light-induced changes of the material properties. Experiments performedon Al-doped ZnO (AZO) thin films show a six-fold increase of the Kerr nonlinear refractive index(n2) at the ENZ wavelength, located in the 1300 nm region. This in turn leads to light-inducedrefractive index changes of the order of unity, thus representing a new paradigm for nonlinear optics.

AB - New propagation regimes for light arise from the ability to tune the dielectric permittivity toextremely low values. Here we demonstrate a universal approach based on the low linear permittivityvalues attained in the epsilon-near-zero (ENZ) regime for enhancing the nonlinear refractive index,which enables remarkable light-induced changes of the material properties. Experiments performedon Al-doped ZnO (AZO) thin films show a six-fold increase of the Kerr nonlinear refractive index(n2) at the ENZ wavelength, located in the 1300 nm region. This in turn leads to light-inducedrefractive index changes of the order of unity, thus representing a new paradigm for nonlinear optics.

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Enhanced Nonlinear Refractive Index in Epsilon-Near-Zero Materials

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Enhanced nonlinear refractive index in epsilon-near-zero materials

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Marcello Ferrera

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