Abstract
The field-stitching method introduced previously [Opt. Lett. 21, 1508 (1996)] allows large-period gratings containing small-scale local structure to be analyzed without requiring excessive computing power. Multiple scattering and the polarization of the electromagnetic field are taken into account by standard rigorous analysis. A variety of calculations demonstrating the accuracy and the speed of the method are made. Also, we report on the optimization by simulated annealing of fan-out gratings with periods of up to 240? and of diffractive cylindrical lenses with a period of 1200?, which has been made possible by field-stitching analysis. © 1997 Optical Society of America.
| Original language | English |
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| Pages (from-to) | 1554-1561 |
| Number of pages | 8 |
| Journal | Journal of the Optical Society of America. A, Optics and Image Science |
| Volume | 14 |
| Issue number | 7 |
| Publication status | Published - Jul 1997 |