Electrochemical Behavior of Ferrosilicides (FexSi) in Neutral and Alkaline Aqueous Electrolytes III. The Nature of Passive Films on FexSi Electrodes

G. H. Kelsall, Richard A. Williams

Research output: Contribution to journalArticle

Abstract

The nature of passive films on oxidized ferrosilicide (Fe.r-Si) alloy electrodes has been studied as a function of alloy composition [0-30 mass percent (m/o) Si] in deoxygenated borate and phthalate buffers using photocurrent spectroscopy, impedance, and x-ray photoelectron spectroscopy (XPS). Passivation was shown to be due to a silica containing Fe(III) oxide film, exhibiting n-type semiconducting properties with a bandgap of 1.9-2.02 eV, for 0-15.8 m/o Si ferrosilicon alloy compositions. The photoelectrochemical and XPS results showed clear evidence of overgrowth by silica, thus explaining the superior corrosion resistance of ferrosilicides compared with iron. No boron species were found to be incorporated in the oxide film.

Original languageEnglish
Pages (from-to)951-957
Number of pages7
JournalJournal of The Electrochemical Society
Volume138
Issue number4
DOIs
Publication statusPublished - 1991

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Materials Chemistry
  • Electrochemistry

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