We report the use of an electrochemical iodine cell to dope epitaxial ZnSe grown by molecular beam epitaxy (MBE) over a range of carrier concentrations from 1016 to 1019 cm-3. The doping levels throughout the layers have been measured by electrochemical CV profiling and calibrated in terms of the cell flux. Photoluminescence and Hall data confirm the growth of well behaved n-type ZnSe. © 1992.
|Number of pages||4|
|Journal||Journal of Crystal Growth|
|Publication status||Published - 2 Feb 1992|