Development of a model for high precursor conversion efficiency pulsed-pressure chemical vapor deposition (PP-CVD) processing

Hadley M. Cave, Susan P. Krumdieck, Mark C. Jermy

Research output: Contribution to journalArticle

23 Citations (Scopus)

Abstract

The unsteady pulsed-pressure chemical vapour deposition (PP-CVD) technique offers an increase in process intensification over conventional CVD processes due to the high precursor utilisation efficiency. A numerical model of the movement of precursor particles in the process is developed to study the high efficiencies observed experimentally in this process. The modelling procedures were verified via a study of velocity persistence in an equilibrium gas and through direct simulation Monte Carlo (DSMC) modelling of unsteady self-diffusion processes. The results demonstrate that in the PP-CVD process the arrival time for precursor particles at the deposition surface is much less than the reactor pump-down time, resulting in high precursor conversion efficiencies. Higher conversion efficiency was found to correlate with smaller size carrier gas molecules and moderate reactor peak pressure.

Original languageEnglish
Pages (from-to)120-128
Number of pages9
JournalChemical Engineering Journal
Volume135
Issue number1-2
DOIs
Publication statusPublished - 15 Jan 2008

Keywords

  • Diffusion
  • DSMC
  • Precursor conversion efficiency
  • Process modelling
  • Pulsed-pressure chemical vapour deposition (PP-CVD)

ASJC Scopus subject areas

  • Chemistry(all)
  • Environmental Chemistry
  • Chemical Engineering(all)
  • Industrial and Manufacturing Engineering

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