Abstract
From the engineering perspective, the CVD system is essentially a “molecular scale” manufacturing facility. Just like any factory, the production rate is determined by the slowest step in the manufacturing process. The product quality, production economy and efficiency are assured by initial process...
| Original language | English |
|---|---|
| Title of host publication | Chemical Vapour Deposition |
| Subtitle of host publication | Precursors, Processes and Applications |
| Editors | A. C. Jones, M. L. Hitchman |
| Place of Publication | Cambridge, UK |
| Publisher | Royal Society of Chemistry |
| Chapter | 2 |
| Pages | 37-92 |
| Number of pages | 56 |
| ISBN (Electronic) | 9781847558794 |
| ISBN (Print) | 9780854044658 |
| DOIs | |
| Publication status | Published - 2009 |
Keywords
- Chemical vapor deposition
- Thin Film materials