Abstract
Freestanding crystalline diamond/graphite nanoflake hybrid films have been deposited in H2/CH4 gas mixtures using a high pressure (1.3 × 104 Pa) direct current plasma discharge. Sacrificial layers of close-packed silica microspheres were used as a matrix to produce dual gas chemistries on the plasma-facing and reverse sides of the microspheres. A continuous polycrystalline diamond film was formed on the front surface whilst graphite was deposited in the form of nanoflakes as a thinner hemispherical layer on the reverse side of the silica spheres respectively. Chemical etching of the silica matrix yielded crystalline diamond/well-aligned graphite nanoflakes hybrid films. © 2010 Elsevier B.V. All rights reserved.
| Original language | English |
|---|---|
| Pages (from-to) | 625-629 |
| Number of pages | 5 |
| Journal | Thin Solid Films |
| Volume | 519 |
| Issue number | 2 |
| DOIs | |
| Publication status | Published - 1 Nov 2010 |
Keywords
- Carbon
- Chemical vapor deposition
- Diamond
- Graphite
- Hybrid films
- Nanoflakes
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