Crystalline diamond/graphite nanoflake hybrid films

Jae K. Lee, Phillip John

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)


Freestanding crystalline diamond/graphite nanoflake hybrid films have been deposited in H2/CH4 gas mixtures using a high pressure (1.3 × 104 Pa) direct current plasma discharge. Sacrificial layers of close-packed silica microspheres were used as a matrix to produce dual gas chemistries on the plasma-facing and reverse sides of the microspheres. A continuous polycrystalline diamond film was formed on the front surface whilst graphite was deposited in the form of nanoflakes as a thinner hemispherical layer on the reverse side of the silica spheres respectively. Chemical etching of the silica matrix yielded crystalline diamond/well-aligned graphite nanoflakes hybrid films. © 2010 Elsevier B.V. All rights reserved.

Original languageEnglish
Pages (from-to)625-629
Number of pages5
JournalThin Solid Films
Issue number2
Publication statusPublished - 1 Nov 2010


  • Carbon
  • Chemical vapor deposition
  • Diamond
  • Graphite
  • Hybrid films
  • Nanoflakes


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