Freestanding crystalline diamond/graphite nanoflake hybrid films have been deposited in H2/CH4 gas mixtures using a high pressure (1.3 × 104 Pa) direct current plasma discharge. Sacrificial layers of close-packed silica microspheres were used as a matrix to produce dual gas chemistries on the plasma-facing and reverse sides of the microspheres. A continuous polycrystalline diamond film was formed on the front surface whilst graphite was deposited in the form of nanoflakes as a thinner hemispherical layer on the reverse side of the silica spheres respectively. Chemical etching of the silica matrix yielded crystalline diamond/well-aligned graphite nanoflakes hybrid films. © 2010 Elsevier B.V. All rights reserved.
- Chemical vapor deposition
- Hybrid films