Critical thickness for nanostructure self-assembly during Stranski-Krastanow growth

David E. Jesson; Timothy P. Munt; Chaogang Lou

doi:10.1143/JJAP.43.7230

Critical thickness for nanostructure self-assembly during Stranski-Krastanow growth

David E. Jesson, Timothy P. Munt, Chaogang Lou

School of Engineering & Physical Sciences

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

Stranski-Krastanow growth is discussed in the context of a simple classical nucleation model which emphasizes the important role of the wetting layer. The model predicts a rapid transition to a 3D island phase which chiefly depends on the interaction between atoms in the wetting layer and the substrate. A simple analytical expression for the critical thickness at which the transition occurs is derived.

Original language	English
Pages (from-to)	7230-7231
Number of pages	2
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	43
Issue number	10
DOIs	https://doi.org/10.1143/JJAP.43.7230
Publication status	Published - Oct 2004

Keywords

Critical thickness
Nanostructures
Nucleation
Quantum dots
Stranski-Krastanow growth

Access to Document

10.1143/JJAP.43.7230

Cite this

@article{1c3db43b50d44c1e9bb9860c46962267,

title = "Critical thickness for nanostructure self-assembly during Stranski-Krastanow growth",

abstract = "Stranski-Krastanow growth is discussed in the context of a simple classical nucleation model which emphasizes the important role of the wetting layer. The model predicts a rapid transition to a 3D island phase which chiefly depends on the interaction between atoms in the wetting layer and the substrate. A simple analytical expression for the critical thickness at which the transition occurs is derived.",

keywords = "Critical thickness, Nanostructures, Nucleation, Quantum dots, Stranski-Krastanow growth",

author = "Jesson, {David E.} and Munt, {Timothy P.} and Chaogang Lou",

year = "2004",

month = oct,

doi = "10.1143/JJAP.43.7230",

language = "English",

volume = "43",

pages = "7230--7231",

journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

number = "10",

}

TY - JOUR

T1 - Critical thickness for nanostructure self-assembly during Stranski-Krastanow growth

AU - Jesson, David E.

AU - Munt, Timothy P.

AU - Lou, Chaogang

PY - 2004/10

Y1 - 2004/10

N2 - Stranski-Krastanow growth is discussed in the context of a simple classical nucleation model which emphasizes the important role of the wetting layer. The model predicts a rapid transition to a 3D island phase which chiefly depends on the interaction between atoms in the wetting layer and the substrate. A simple analytical expression for the critical thickness at which the transition occurs is derived.

AB - Stranski-Krastanow growth is discussed in the context of a simple classical nucleation model which emphasizes the important role of the wetting layer. The model predicts a rapid transition to a 3D island phase which chiefly depends on the interaction between atoms in the wetting layer and the substrate. A simple analytical expression for the critical thickness at which the transition occurs is derived.

KW - Critical thickness

KW - Nanostructures

KW - Nucleation

KW - Quantum dots

KW - Stranski-Krastanow growth

U2 - 10.1143/JJAP.43.7230

DO - 10.1143/JJAP.43.7230

M3 - Article

SN - 0021-4922

VL - 43

SP - 7230

EP - 7231

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

IS - 10

ER -

Critical thickness for nanostructure self-assembly during Stranski-Krastanow growth

Abstract

Keywords

Access to Document

Fingerprint

Cite this