INIS
thin films
100%
deposition
100%
films
100%
lasers
100%
silicates
100%
crack growth
100%
scanning electron microscopy
25%
transmission
25%
temperature range 0273-0400 k
25%
ions
25%
doped materials
25%
etching
25%
substrates
12%
dynamics
12%
losses
12%
length
12%
spectra
12%
surfaces
12%
thickness
12%
oxygen
12%
glass
12%
beams
12%
coupling
12%
pulses
12%
silica
12%
waveguides
12%
atomic force microscopy
12%
computer codes
12%
silicon oxides
12%
irradiation
12%
morphology
12%
aging
12%
inspection
12%
refraction
12%
lanthanum fluorides
12%
excimer lasers
12%
cracks
12%
prisms
12%
optical microscopy
12%
argon fluorides
12%
spectrophotometers
12%
Physics
Crack Growth
100%
Thin Films
100%
Room Temperature
100%
Scanning Electron Microscopy
100%
Pulsed Laser Deposition
100%
Laser Pulse
50%
Flow Dynamics
50%
Spectra
50%
Fluence
50%
Optical Waveguides
50%
Film Thickness
50%
Atomic Force Microscopy
50%
Excimer Laser
50%
Spectrophotometer
50%
Engineering
Pulsed Laser
100%
Deposited Film
100%
Crack Growth Behavior
100%
Thin Films
100%
Room Temperature
66%
Optical Transmission
66%
Flow Dynamics
33%
Pure Silica
33%
Pulse Length
33%
Target Surface
33%
Aging Effect
33%
Laser Fluence
33%
Optical Spectrum
33%
Refraction Index
33%
Excimer Laser
33%
Atomic Force Microscopy
33%
Extinction Coefficient
33%
Waveguide
33%
Material Science
Pulsed Laser Deposition
100%
Film
100%
Crack Growth
100%
Silicate
100%
Thin Films
100%
Scanning Electron Microscopy
33%
Al2O3
16%
Waveguide
16%
Silicate Glass
16%
Film Thickness
16%
Laser Pulse
16%
Flow Dynamics
16%
Silicon Dioxide
16%