Conformality investigation of titanium dioxide thin films on 3-D micrometer- and nanometer-scale features by pulsed-pressure metal-organic CVD

Vilailuck Siriwongrungson; Susan P. Krumdieck; Maan M. Alkaisi

doi:10.1002/cvde.201106912

Conformality investigation of titanium dioxide thin films on 3-D micrometer- and nanometer-scale features by pulsed-pressure metal-organic CVD

Vilailuck Siriwongrungson^*, Susan P. Krumdieck, Maan M. Alkaisi

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

12 Citations (Scopus)

Abstract

The influence of the processing parameters on conformality is studied for pulsed-pressure (PP) metal-organic (MO)CVD. A statistical method to measure conformality, and a model for pulse vapor exposure are presented. Titanium dioxide (TiO ₂) thin films are deposited from a liquid titanium isopropoxide (TTIP, Ti(OPr) ₄) solution with no carrier gas on silicon and silicon nitride substrates with 3-D micrometer- and nanometer-scale structures. The deposited films are columnar anatase TiO ₂ with thicknesses between 130nm and 310nm, controlled by the number of pulses. The statistical conformality varies from 0.81 to 0.93, decreased slightly with increasing deposition temperature, and is insensitive to pulse exposure.

Original language	English
Pages (from-to)	327-336
Number of pages	10
Journal	Chemical Vapor Deposition
Volume	17
Issue number	10-12
DOIs	https://doi.org/10.1002/cvde.201106912
Publication status	Published - Dec 2011

Keywords

Conformality
Conformity
PP-MOCVD
Step coverage
Titanium dioxide

ASJC Scopus subject areas

General Chemistry
Surfaces and Interfaces
Process Chemistry and Technology

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10.1002/cvde.201106912

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title = "Conformality investigation of titanium dioxide thin films on 3-D micrometer- and nanometer-scale features by pulsed-pressure metal-organic CVD",

abstract = "The influence of the processing parameters on conformality is studied for pulsed-pressure (PP) metal-organic (MO)CVD. A statistical method to measure conformality, and a model for pulse vapor exposure are presented. Titanium dioxide (TiO 2) thin films are deposited from a liquid titanium isopropoxide (TTIP, Ti(OPr) 4) solution with no carrier gas on silicon and silicon nitride substrates with 3-D micrometer- and nanometer-scale structures. The deposited films are columnar anatase TiO 2 with thicknesses between 130nm and 310nm, controlled by the number of pulses. The statistical conformality varies from 0.81 to 0.93, decreased slightly with increasing deposition temperature, and is insensitive to pulse exposure.",

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AU - Siriwongrungson, Vilailuck

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AU - Alkaisi, Maan M.

PY - 2011/12

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AB - The influence of the processing parameters on conformality is studied for pulsed-pressure (PP) metal-organic (MO)CVD. A statistical method to measure conformality, and a model for pulse vapor exposure are presented. Titanium dioxide (TiO 2) thin films are deposited from a liquid titanium isopropoxide (TTIP, Ti(OPr) 4) solution with no carrier gas on silicon and silicon nitride substrates with 3-D micrometer- and nanometer-scale structures. The deposited films are columnar anatase TiO 2 with thicknesses between 130nm and 310nm, controlled by the number of pulses. The statistical conformality varies from 0.81 to 0.93, decreased slightly with increasing deposition temperature, and is insensitive to pulse exposure.

KW - Conformality

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KW - Step coverage

KW - Titanium dioxide

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Conformality investigation of titanium dioxide thin films on 3-D micrometer- and nanometer-scale features by pulsed-pressure metal-organic CVD

Abstract

Keywords

ASJC Scopus subject areas

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