Conformality investigation of titanium dioxide thin films on 3-D micrometer- and nanometer-scale features by pulsed-pressure metal-organic CVD

Vilailuck Siriwongrungson, Susan P. Krumdieck, Maan M. Alkaisi

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

The influence of the processing parameters on conformality is studied for pulsed-pressure (PP) metal-organic (MO)CVD. A statistical method to measure conformality, and a model for pulse vapor exposure are presented. Titanium dioxide (TiO 2) thin films are deposited from a liquid titanium isopropoxide (TTIP, Ti(OPr) 4) solution with no carrier gas on silicon and silicon nitride substrates with 3-D micrometer- and nanometer-scale structures. The deposited films are columnar anatase TiO 2 with thicknesses between 130nm and 310nm, controlled by the number of pulses. The statistical conformality varies from 0.81 to 0.93, decreased slightly with increasing deposition temperature, and is insensitive to pulse exposure.

Original languageEnglish
Pages (from-to)327-336
Number of pages10
JournalChemical Vapor Deposition
Volume17
Issue number10-12
DOIs
Publication statusPublished - Dec 2011

Keywords

  • Conformality
  • Conformity
  • PP-MOCVD
  • Step coverage
  • Titanium dioxide

ASJC Scopus subject areas

  • Chemistry(all)
  • Surfaces and Interfaces
  • Process Chemistry and Technology

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