Focused Ion Beam (FIB) and Nano-Imprint Forming (NIF) have gained recently major interest because of their potential to enable the fabrication of precision engineering parts and to deliver high resolution, low-cost and high-throughput production of fine sub-micrometre structures respectively. Using computational modelling and simulation becomes increasingly important in assessing capabilities and risks of defects with respect to product manufacturability, quality, reliability and performance, as well as controlling and optimising the process parameters. A computational model that predicts the milling depth as function of the ion beam dwell times and a number of process parameters in the case of FIB milling is investigated and experimentally validated. The focus in the NIF study is on modelling the material deformation and the filling of the pattern grooves during the mould pressing using non-linear large deformation finite element analysis with hyperelastic non-compressive material behaviour. Simulation results are used to understand the risk of imperfections in the pattern replication and to identify the optimal process parameters and their interaction. © 2010 IOP Publishing Ltd.
|Journal||Journal of Physics: Conference Series|
|Publication status||Published - 2010|
|Event||Progress in Solid State and Molecular Electronics, Ionics and Photonics, 16 ISCMP - Varna, Bulgaria|
Duration: 29 Aug 2010 → 3 Sept 2010