Computational modelling and optimisation of the fabrication of nano-structures using focused ion beam and imprint forming technologies

S. Stoyanov, C. Bailey, Y. K. Tang, S. Marson, A. Dyer, D. Allen, M. Desmulliez

Research output: Contribution to journalArticle

Abstract

Focused Ion Beam (FIB) and Nano-Imprint Forming (NIF) have gained recently major interest because of their potential to enable the fabrication of precision engineering parts and to deliver high resolution, low-cost and high-throughput production of fine sub-micrometre structures respectively. Using computational modelling and simulation becomes increasingly important in assessing capabilities and risks of defects with respect to product manufacturability, quality, reliability and performance, as well as controlling and optimising the process parameters. A computational model that predicts the milling depth as function of the ion beam dwell times and a number of process parameters in the case of FIB milling is investigated and experimentally validated. The focus in the NIF study is on modelling the material deformation and the filling of the pattern grooves during the mould pressing using non-linear large deformation finite element analysis with hyperelastic non-compressive material behaviour. Simulation results are used to understand the risk of imperfections in the pattern replication and to identify the optimal process parameters and their interaction. © 2010 IOP Publishing Ltd.

Original languageEnglish
Article number012008
JournalJournal of Physics: Conference Series
Volume253
Issue number1
DOIs
Publication statusPublished - 2010
EventProgress in Solid State and Molecular Electronics, Ionics and Photonics, 16 ISCMP - Varna, Bulgaria
Duration: 29 Aug 20103 Sep 2010

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