TY - JOUR
T1 - Binary and Ternary Metal Oxide Semiconductor Thin Films for Effective Gas Sensing Applications: A Comprehensive Review and Future Prospects
AU - Sivaperuman, Kalainathan
AU - Thomas, Anju
AU - Thangavel, Ravikumar
AU - Thirumalaisamy, Logu
AU - Palanivel, Soundarrajan
AU - Pitchaimuthu, Sudhagar
AU - Ahsan, Nazmul
AU - Okada, Yoshitaka
N1 - Funding Information:
Dr. Sudhagar Pitchaimuthu is an Associate Professor at the School of Engineering and Physical Sciences, Heriot-Watt University, UK. He was the recipient of Sêr Cymru II-Rising Star Fellow and JSPS Fellowship awards. His research background is in ‘nanomaterial synthesis and coatings’ for constructing low-cost solar energy conversion systems. He mainly focuses on transforming the abundance of sustainable solar energy into multifunctional applications such as energy conversion devices, environmental clean-up (photocatalytic water treatment, air purification, artificial CO 2 recycling), and sensors. Currently, he led the net-zero hydrogen research at Research Centre for Carbon Solutions at Heriot-Watt University, UK.
Funding Information:
The authors would like to thank the Vellore Institute of Technology for providing the necessary facilities to complete this review. The author T. Logu acknowledges Royal Society-SERB Newton International Fellowship (NIF\R1\192769).
Publisher Copyright:
© 2023 Elsevier Ltd
PY - 2024/4
Y1 - 2024/4
N2 - For a couple of decades, there is a tremendous growth in industries and technology in the global level. Unfortunately, emerging new industries became a main reason for rising air pollution in the earth’s environment. Hence, the health issues associated with air pollution are on a high scale that alarm us to monitor the quality of the air that we breathe, and demand development of efficient gas sensor devices. Recently, the groups of binary and ternary metal oxide semiconductors are regarded as reliable materials for gas sensing applications. Chemical spray pyrolysis, one of the efficient techniques to fabricate thin films with high reproducibility is triggering recent research on fabricating films for gas sensor applications. Here, the focus is on spray-deposited binary and ternary metal oxide thin films for gas sensing applications. The working mechanism of metal oxide sensors have been discussed comprehensively on the basis of redox reaction processes that caused band bending and variation of electrical conductivity of devices in the presence of target gases. This review also points out the shortcomings of existing technology and the possible ways to overcome them, and eventually future evolution in the field of gas sensor are also hypothesized.
AB - For a couple of decades, there is a tremendous growth in industries and technology in the global level. Unfortunately, emerging new industries became a main reason for rising air pollution in the earth’s environment. Hence, the health issues associated with air pollution are on a high scale that alarm us to monitor the quality of the air that we breathe, and demand development of efficient gas sensor devices. Recently, the groups of binary and ternary metal oxide semiconductors are regarded as reliable materials for gas sensing applications. Chemical spray pyrolysis, one of the efficient techniques to fabricate thin films with high reproducibility is triggering recent research on fabricating films for gas sensor applications. Here, the focus is on spray-deposited binary and ternary metal oxide thin films for gas sensing applications. The working mechanism of metal oxide sensors have been discussed comprehensively on the basis of redox reaction processes that caused band bending and variation of electrical conductivity of devices in the presence of target gases. This review also points out the shortcomings of existing technology and the possible ways to overcome them, and eventually future evolution in the field of gas sensor are also hypothesized.
KW - Binary metal oxide
KW - Chemical spray pyrolysis
KW - Doping
KW - Gas sensor
KW - Redox reaction
KW - Ternary metal oxide
UR - http://www.scopus.com/inward/record.url?scp=85179124380&partnerID=8YFLogxK
U2 - 10.1016/j.pmatsci.2023.101222
DO - 10.1016/j.pmatsci.2023.101222
M3 - Article
SN - 0079-6425
VL - 142
JO - Progress in Materials Science
JF - Progress in Materials Science
M1 - 101222
ER -