Abstract
An overview is presented of the technique of near-edge X-ray absorption fine structure (NEXAFS) spectroscopy highlighting, in particular, its capability to probe the structure of molecular interfaces without recourse to the use of ultra-high vacuum (UHV)-based analytical techniques. NEXAFS spectroscopy data recorded in the spectral region close to the C and N K absorption edges (ca. 200-500 eV) on beamline U1A at the national synchrotron light source (NSLS) at Brookhaven National Laboratory (USA) are presented covering studies on long-chain hydrocarbon thin films, LB films and organic single crystals. Details are given of a new environmental NEXAFS facility currently being commissioned on beamline U3C at the NSLS which will enable samples to be studied at temperatures and pressures close to the process environments of practical industrial materials. © 1999 Elsevier Science B.V. All rights reserved.
| Original language | English |
|---|---|
| Pages (from-to) | 275-281 |
| Number of pages | 7 |
| Journal | Journal of Crystal Growth |
| Volume | 198-199 |
| Issue number | PART I |
| Publication status | Published - 1999 |
Keywords
- Molecular surfaces/interfaces
- Polarised NEXAFS spectroscopy