Application of a liquid crystal spatial light modulator to laser marking

Jonathan P. Parry; Rainer J Beck; Jonathan D. Shephard; Duncan P. Hand

doi:10.1364/AO.50.001779

Application of a liquid crystal spatial light modulator to laser marking

Jonathan P. Parry, Rainer J Beck, Jonathan D. Shephard, Duncan P. Hand

Research output: Contribution to journal › Article › peer-review

25 Citations (Scopus)

225 Downloads (Pure)

Abstract

Laser marking is demonstrated using a nanosecond (ns) pulse duration laser in combination with a liquid crystal spatial light modulator to generate two-dimensional patterns directly onto thin films and bulk metal surfaces. Previous demonstrations of laser marking with such devices have been limited to low average power lasers. Application in the ns regime enables more complex, larger scale marks to be generated with more widely available and industrially proven laser systems. The dynamic nature of the device is utilized to improve mark quality by reducing the impact of the inherently speckled intensity distribution across the generated image and reduce thermal effects in the marked surface. (C) 2011 Optical Society of America

Original language	English
Pages (from-to)	1779-1785
Number of pages	7
Journal	Applied Optics
Volume	50
Issue number	12
DOIs	https://doi.org/10.1364/AO.50.001779
Publication status	Published - 20 Apr 2011

Keywords

HOLOGRAPHIC OPTICAL TWEEZERS
PROJECTION
SPECKLE
PATTERNS
BEAM

Access to Document

10.1364/AO.50.001779

Download as PDFFinal published version, 684 KB

Cite this

@article{2bfab7974af742e19a6b688054a4c1b9,

title = "Application of a liquid crystal spatial light modulator to laser marking",

abstract = "Laser marking is demonstrated using a nanosecond (ns) pulse duration laser in combination with a liquid crystal spatial light modulator to generate two-dimensional patterns directly onto thin films and bulk metal surfaces. Previous demonstrations of laser marking with such devices have been limited to low average power lasers. Application in the ns regime enables more complex, larger scale marks to be generated with more widely available and industrially proven laser systems. The dynamic nature of the device is utilized to improve mark quality by reducing the impact of the inherently speckled intensity distribution across the generated image and reduce thermal effects in the marked surface. (C) 2011 Optical Society of America",

keywords = "HOLOGRAPHIC OPTICAL TWEEZERS, PROJECTION, SPECKLE, PATTERNS, BEAM",

author = "Parry, {Jonathan P.} and Beck, {Rainer J} and Shephard, {Jonathan D.} and Hand, {Duncan P.}",

year = "2011",

month = apr,

day = "20",

doi = "10.1364/AO.50.001779",

language = "English",

volume = "50",

pages = "1779--1785",

journal = "Applied Optics",

issn = "0003-6935",

number = "12",

}

TY - JOUR

T1 - Application of a liquid crystal spatial light modulator to laser marking

AU - Parry, Jonathan P.

AU - Beck, Rainer J

AU - Shephard, Jonathan D.

AU - Hand, Duncan P.

PY - 2011/4/20

Y1 - 2011/4/20

N2 - Laser marking is demonstrated using a nanosecond (ns) pulse duration laser in combination with a liquid crystal spatial light modulator to generate two-dimensional patterns directly onto thin films and bulk metal surfaces. Previous demonstrations of laser marking with such devices have been limited to low average power lasers. Application in the ns regime enables more complex, larger scale marks to be generated with more widely available and industrially proven laser systems. The dynamic nature of the device is utilized to improve mark quality by reducing the impact of the inherently speckled intensity distribution across the generated image and reduce thermal effects in the marked surface. (C) 2011 Optical Society of America

AB - Laser marking is demonstrated using a nanosecond (ns) pulse duration laser in combination with a liquid crystal spatial light modulator to generate two-dimensional patterns directly onto thin films and bulk metal surfaces. Previous demonstrations of laser marking with such devices have been limited to low average power lasers. Application in the ns regime enables more complex, larger scale marks to be generated with more widely available and industrially proven laser systems. The dynamic nature of the device is utilized to improve mark quality by reducing the impact of the inherently speckled intensity distribution across the generated image and reduce thermal effects in the marked surface. (C) 2011 Optical Society of America

KW - HOLOGRAPHIC OPTICAL TWEEZERS

KW - PROJECTION

KW - SPECKLE

KW - PATTERNS

KW - BEAM

U2 - 10.1364/AO.50.001779

DO - 10.1364/AO.50.001779

M3 - Article

C2 - 21509071

VL - 50

SP - 1779

EP - 1785

JO - Applied Optics

JF - Applied Optics

SN - 0003-6935

IS - 12

ER -