Application of a focused ion beam system to nanolithography

Richard M. Langford, Shamus O'Reilly, Iain J. McEwen

Research output: Contribution to journalArticle

Abstract

Nano-imprint lithography (NIL) and micro-contact printing (MCP) are currently receiving considerable attention as techniques that can be used for low cost nanolithography. Here the application of a focused ion beam (FIB) system for the analysis of the elastomer stamps and imprinted patterns which are used in these nanolithography techniques is discussed. It is shown that the 'lift-out' technique can be used to prepare cross-sections of both the elastomer poly(dimethylsiloxane) (PDMS) stamps and the imprinted poly(methylmethacrylate) (PMMA) patterns. In addition, the use of the FIB system to prepare masters such as gratings and structures with curved shapes that would be difficult to fabricate using conventional processing techniques is discussed.

Original languageEnglish
Pages (from-to)65-70
Number of pages6
JournalMRS Online Proceedings Library
Volume739
Publication statusPublished - 2002
EventThree-Dimensional Nanoengineered Assemblies - Boston, MA, United States
Duration: 1 Dec 20025 Dec 2002

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    Langford, R. M., O'Reilly, S., & McEwen, I. J. (2002). Application of a focused ion beam system to nanolithography. MRS Online Proceedings Library, 739, 65-70.