Nano-imprint lithography (NIL) and micro-contact printing (MCP) are currently receiving considerable attention as techniques that can be used for low cost nanolithography. Here the application of a focused ion beam (FIB) system for the analysis of the elastomer stamps and imprinted patterns which are used in these nanolithography techniques is discussed. It is shown that the 'lift-out' technique can be used to prepare cross-sections of both the elastomer poly(dimethylsiloxane) (PDMS) stamps and the imprinted poly(methylmethacrylate) (PMMA) patterns. In addition, the use of the FIB system to prepare masters such as gratings and structures with curved shapes that would be difficult to fabricate using conventional processing techniques is discussed.
|Number of pages||6|
|Journal||MRS Online Proceedings Library|
|Publication status||Published - 2002|
|Event||Three-Dimensional Nanoengineered Assemblies - Boston, MA, United States|
Duration: 1 Dec 2002 → 5 Dec 2002