Alloying and Doping Control in the Layered Metal Phosphide Thermoelectric CaCuP

Robert J. Quinn, Rajan Biswas, Jan-Willem G. Bos

    Research output: Contribution to journalArticlepeer-review

    3 Citations (Scopus)
    33 Downloads (Pure)

    Abstract

    We recently identified CaCuP as a potential low cost, low density thermoelectric material, achieving zT = 0.5 at 792 K. Its performance is limited by a large lattice thermal conductivity, κL, and by intrinsically large p-type doping levels. In this paper, we address the thermal and electronic tunability of CaCuP. Isovalent alloying with As is possible over the full solid solution range in the CaCuP1–xAsx series. This leads to a reduction in κL due to mass fluctuations but also to a detrimental increase in p-type doping due to increasing Cu vacancies, which prevents zT improvement. Phase boundary mapping, exploiting small deviations from 1:1:1 stoichiometry, was used to explore doping tunability, finding increasing p-type doping to be much easier than decreasing the doping level. Calculation of the Lorenz number within the single parabolic band approximation leads to an unrealistic low κL for highly doped samples consistent with the multiband behavior in these materials. Overall, CaCuP and slightly Cu-enriched CaCu1.02P yield the best performance, with zT approaching 0.6 at 873 K.
    Original languageEnglish
    Pages (from-to)2879-2888
    Number of pages10
    JournalACS Applied Electronic Materials
    Volume6
    Issue number5
    Early online date14 Sept 2023
    DOIs
    Publication statusPublished - 28 May 2024

    Keywords

    • ZrBeSi structure
    • alloying
    • layered semiconductor
    • metal phosphide
    • phase boundary mapping
    • thermoelectric material

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Materials Chemistry
    • Electrochemistry

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