The process of rapid laser patterning (RLP) of ITO thin films on glass has been adopted into mass production by the flat panel displays industry. This process involves high speed selective removal of thin films for the manufacture of transparent electrode structures and uses high average power, high peak power, nanosecond pulse duration Nd:YAG DPSS lasers. In this paper the laser patterning process and removal mechanism are described in detail with consideration given to how laser pulse characteristics influence features of the process. Subsequent issues such as the effect of the laser ablation plume, debris, substrate heating and redeposition of ITO residue are also considered.
|Title of host publication||ICALEO 2008 - 27th International Congress on Applications of Lasers and Electro-Optics, Congress Proceedings|
|Number of pages||8|
|Publication status||Published - 2008|
|Event||ICALEO 2008 - 27th International Congress on Applications of Lasers and Electro-Optics - Temecula, CA, United States|
Duration: 20 Oct 2008 → 23 Oct 2008
|Conference||ICALEO 2008 - 27th International Congress on Applications of Lasers and Electro-Optics|
|Period||20/10/08 → 23/10/08|