A detailed study of the mechanism of rapid laser patterning of indium tin oxide thin films

Paul M. Harrison, Nick Hay, Duncan Hand, Jozef Wendland

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The process of rapid laser patterning (RLP) of ITO thin films on glass has been adopted into mass production by the flat panel displays industry. This process involves high speed selective removal of thin films for the manufacture of transparent electrode structures and uses high average power, high peak power, nanosecond pulse duration Nd:YAG DPSS lasers. In this paper the laser patterning process and removal mechanism are described in detail with consideration given to how laser pulse characteristics influence features of the process. Subsequent issues such as the effect of the laser ablation plume, debris, substrate heating and redeposition of ITO residue are also considered.

Original languageEnglish
Title of host publicationICALEO 2008 - 27th International Congress on Applications of Lasers and Electro-Optics, Congress Proceedings
Pages377-384
Number of pages8
Publication statusPublished - 2008
EventICALEO 2008 - 27th International Congress on Applications of Lasers and Electro-Optics - Temecula, CA, United States
Duration: 20 Oct 200823 Oct 2008

Conference

ConferenceICALEO 2008 - 27th International Congress on Applications of Lasers and Electro-Optics
CountryUnited States
CityTemecula, CA
Period20/10/0823/10/08

Fingerprint Dive into the research topics of 'A detailed study of the mechanism of rapid laser patterning of indium tin oxide thin films'. Together they form a unique fingerprint.

  • Cite this

    Harrison, P. M., Hay, N., Hand, D., & Wendland, J. (2008). A detailed study of the mechanism of rapid laser patterning of indium tin oxide thin films. In ICALEO 2008 - 27th International Congress on Applications of Lasers and Electro-Optics, Congress Proceedings (pp. 377-384)