A chemical assessement of the suitability of allyl-iso-propyltelluride as a Te precursor for metal-organic vapour phase epitaxy

Janet E. Hails, David J. Cole-Hamilton^*, John Stevenson, William Bell, Douglas F. Foster, David Ellis

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

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@article{233ca4ed0846413b9158867072761031,

title = "A chemical assessement of the suitability of allyl-iso-propyltelluride as a Te precursor for metal-organic vapour phase epitaxy",

author = "Hails, {Janet E.} and Cole-Hamilton, {David J.} and John Stevenson and William Bell and Foster, {Douglas F.} and David Ellis",

year = "2001",

month = apr,

doi = "10.1016/S0022-0248(01)00767-9",

language = "English",

volume = "224",

pages = "21--31",

journal = "Journal of Crystal Growth",

issn = "0022-0248",

publisher = "Elsevier B.V.",

number = "1-2",

}

TY - JOUR

T1 - A chemical assessement of the suitability of allyl-iso-propyltelluride as a Te precursor for metal-organic vapour phase epitaxy

AU - Hails, Janet E.

AU - Cole-Hamilton, David J.

AU - Stevenson, John

AU - Bell, William

AU - Foster, Douglas F.

AU - Ellis, David

PY - 2001/4

Y1 - 2001/4

U2 - 10.1016/S0022-0248(01)00767-9

DO - 10.1016/S0022-0248(01)00767-9

M3 - Article

SN - 0022-0248

VL - 224

SP - 21

EP - 31

JO - Journal of Crystal Growth

JF - Journal of Crystal Growth

IS - 1-2

ER -